JAWAHARLAL NEHRU TECHNOLOGICAL UNIVERSITY HYDERABAD

Course Objectives

The course is intended for students to:

• Acquire knowledge about MEMS devices and their applications in various domains.
• Understand the techniques to fabricate MEMS devices.
• Learn the design considerations for MEMS devices and Microsystems.
• Learning to characterize Microsystems using optical and electron microscopy and other techniques.

Course Outcomes

After completion of the course the student is able to:

• Apply fundamental knowledge of physics and chemistry to design microsystems for various applications.
• Select appropriate tools and techniques considering particular practical need for a microsystem application.
• Realize the need for advancement of technology towards microsystems for better living in the society.
• Understand the need to keep oneself updated constantly to understand the ease of use of emerging technologies.

UNIT - I

Fundamentals of MEMS: Overview of MEMS and Microsystems; Evolution of microfabrication; Applications of MEMS in optical devices (Micro-Opto-Electro-Mechanical Systems or MOEMS), healthcare and biomedicine (including Bio-MEMS and Bio-MOEMS), aerospace, telecommunications, consumer products, automotive, and industrial products; Working principles of microsystems: Microsensors – acoustic wave, bio-, chemical, optical, pressure, thermal; Microactuation – thermal, shape-memory alloys, piezoelectric, electrostatic; MEMS devices – Microgrippers; Micromotors; Microfluidics – Micropumps, Microvalves; Micro accelerometers

UNIT - II

Materials for MEMS and Microsystems: Substrates and Wafers; Silicon as a Substrate, Silicon Compounds, Silicon piezoresistors, Non-silicon-based materials: Gallium Arsenide, Gallium Nitride, Quartz, Piezeoelectric Crystals, Polymers.

UNIT - III

Basics of Micromanufacturing: Photolithography; Cleanroom Environment; Deposition techniques: Ion implantation, Diffusion, Vapour Deposition (PVD, CVD, PECVD), Oxidation, Epitaxial growth; Etching techniques: Chemical (Wet) Etching, Plasma (Dry) Etching Design considerations; Process Design; Photomask layout using CAD; Mechanical design overview

UNIT - IV

Fabrication of MEMS: Bulk micromachining, Surface micromachining, LIGA Process, Deep X-Ray Lithography (DXRL)

UNIT - V

Characterization of MEMS: Characterization techniques: Principle of working and operation of: Scanning Electron Microscope (SEM), Transmission Electron Microscope (TEM), Atomic Force Microscope (AFM), X-Ray Diffraction (XRD), Optical microscope

TEXT BOOKS:

• 1. Tai-Ran Hsu, ―MEMS and Microsystems Design and Manufacture‖, Tata McGrawHill, 2002 (ISBN: 978-0070487093)
• 2. N. Mahalik, ―MEMS‖, McGraw-Hill Education (India) Pvt. Ltd., 2007 (ISBN: 9780070634459)

REFERENCE BOOKS

• 1. Marc J. Madou, ―Fundamentals of Microfabrication: The Science of Miniaturization‖, CRC Press, 2002 (ISBN: 978-0849308260)
• 2. Stephen D. Senturia, ―Microsystem Design‖, Springer, 2004 (ISBN: 9788181285461)
• 3. Ville Kaajakari, ―Practical MEMS‖, Small Gear Publishing, 2009 (ISBN: 9780982299104)