JAWAHARLAL NEHRU TECHNOLOGICAL UNIVERSITY HYDERABAD

Course Objective:

The course covers the importance of thin film technology and nanofabrication, vacuum technology, various physical and chemical methods of thin film a fabrication and various applications of thin films including sensors

Course Outcomes:

• 1. Vacuum technology and principle of vacuum pumps- various types and ranges will be covered.
• 2. Various fabrication methods of thin films will be dealt in detail
• 3. Advantages, applications of thin films for devices also will be discussed

Prerequisite:

• 1. Vacuum pump technology
• 2. Basics of vacuum pump technology Perini and gauge technology

UNIT - I

Vacuum technology: principles of vacuum pumps in range of 10 -2 torr to 10-11 torr, principle of different vacuum pumps: roots pump, rotary, diffusion, turbo molecular pump, cryogenic-pump, ion pump, Ti-sublimation pump, importance of measurement of Pressure, Concept of different gauges: Bayet- Albert gauge, Pirani, Penning and pressure control.

UNIT - II

Physical Vapor Depostion techniques: Thermal evaporation, resistive evaporation, e-beam evaporation, Electron beam evaporation, Laser ablation, Flash and Cathodic arc deposition, Electron beam, Ion beam lithography techniques and Pulsed LASER Deposition, Electrical discharges used in thin film deposition: Sputtering, Glow discharge sputtering, Magnetron sputtering, Ion beam sputtering, Ion plating, difference between thin films and coating.

UNIT - III

Electro deposition, molecular beam epitaxy and laser pyrolysis. Chemical vapor deposition techniques: Advantages and disadvantages of Chemical Vapor deposition (CVD) techniques over PVD techniques, reaction types, Boundaries, and flow, Different kinds of CVD techniques: Metallorganic CVD (MOCVD), Plasma Enhanced CVD (PECVD) Thermally activated CVD, CVD, Spray pyrolysis, etc.

UNIT - IV

Conditions for the formation of thin films: Environment for thin film deposition, deposition parameters and their effects on film growth, formation of thin films (sticking coefficient, formation of thermodynamically stable cluster – theory of nucleation), capillarity theory, Growth modes: zone model for sputtering and evaporation, Island growth, Volmer weber, Layer growth, Van Vawler Megrue, S.K. (Stranski – Krans Favour) mode. Microstructure in thin films, adhesion,

UNIT - V

Properties of thin films: Mechanical, electrical, and optical properties of thin films, few applications of thin films in various fields. Application to Renewable energy technology – Thin film solar cells, Quantum well and Quantum dot solar cells, dye – sensitized solar cells.

REFERENCES:

• 1. Materials Science of Thin Films: Milton Ohring.
• 2. Thin Film Phenomenon by K. L. Chopra, McGraw-Hill
• 3. Methods of Experimental Physics (Vol 14) by G. L. Weissler and R.W. Carlson “Vacuum Physics and Technology”
• 4. A User’s Guide to vacuum Technology by J. F. O’Hanlon, John Wiley, and Sons
• 5. Vacuum Physics and Techniques by T. A. Delchar, Chapman, and Hall
• 6. Evaporation: Nucleation and Growth Kinetics” by J.P. Hirth and G. M. Pound, Pergamon Press M. Tech – I Year – II Sem. (Nano Tech.)